Event: Society for Information Display (SID) UCF Chapter Invited Speaker Series: Albert Wang, Institute of Innovative Semiconductor Manufacturing, National Sun Yat‑sen University (NSYSU), Taiwan
Title: Semiconductor Lithography in the AI Era: What do we do with or without EUV?
Abstract: In this talk, I will talk about the past, present, and future of Moore’s Law from the perspective of a lithographer. What is the role of lithography in the semiconductor industry? What is EUV and its research potential for academia? Why and how can we use machine learning in semiconductor lithography? I will use an example of using machine learning to predict sub-50 nm trench patterning using 193 immersion lithography. Moreover, without using EUV, how can we achieve higher computing power and high-density memory?
About the Speaker: Albert Wang is Chair of Institute of Innovative Semiconductor Manufacturing of NSYSU. He joined NSYSU in 2024 with more than twenty‑five years of experience in semiconductor lithography. Dr. Wang received his MS and PhD in Applied Physics from Caltech. He held technical and managerial roles at TSMC, IBM, Qualcomm, SanDisk, and Western Digital since 1998. He joined the committee of SPIE design-technology co-optimization (DTCO) conference. He was invited to join the panel discussion of “What post-Moore Law might imply for semiconductor industry” at BACUS conference. Dr. Wang has 38 US patents and 6 publications on patterning of semiconductor devices and circuits.
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